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    公开号:NL1036785A1
    申请号:NL1036785
    申请日:2009-03-30
    公开日:2009-10-20
    发明作者:Robert Gabriel Maria Lansbergen；George Hilary Harrold；Richard John Johnson；Hugo Jacobus Gerardus Weijden
    申请人:Asml Netherlands Bv；Asml Holding Nv；
    IPC主号:
    专利说明:

    RAPID EXCHANGE DEVICE FOR LITHOGRAPHY RETICLES
    BACKGROUND
    Field of the Invention [0001J The present invention relates to a lithographic apparatus and a method for manufacturing a device.
    Background Art | 0002) Lithography is widely recognized as a key processes in manufacturing integrated circuits (ICs) as well as other devices and / or structures. A lithographic apparatus is a machine used during lithography, which applies a desired pattern onto a substrate, such as onto a target portion of the substrate. During manufacture of ICs with a lithographic apparatus, a patterning device, which is alternatively referred to as a mask or a reticle, generates a circuit pattern to be formed on an individual layer in an IC. This pattern may be transferred onto the target portion (e.g., including part of, one, or several dies) on the substrate (e.g., a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (e.g., resist) provided on the substrate. In general, a single substrate contains a network or adjacent target portions that are successively patterned. Manufacturing different layers of the IC often requires imaging different patterns on different layers with different reticles. Therefore, reticles must be changed during the lithographic process.
    [0003] The market demands that the lithographic apparatus perform the lithography process as quickly as possible to maximize manufacturing capacity and keep costs per device low. Thus, it is preferable that changing reticles during the lithography process takes the least possible time. Unfortunately, conventional reticle exchange devices are not designed to function in a vacuum environment, and those that are designed to function in a vacuum environment are not fast enough. They also tend to exhibit problems with vacuum sealing and have a large quantity of bearings, both of which lead to further problems or outgassing and particulate contamination. Particulate contamination causes manufacturing defects which waste production capacity, time, and materials. Outgassing can contaminate lenses which reduces the effective exposure power and reduces productivity or destroys lenses entirely. This waste reduces foundry efficiency and increases fabrication expenses.
    SUMMARY
    [0004] It is desirable to provide a reticle exchange device and device manufacturing method that addresses the problem of rapid reticle exchange with minimum particle generation and outgassing in a vacuum lithography system.
    According to an aspect of the invention, there is provided a method for rapidly exchanging lithography reticles. A first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second base plate. The first and second base plates are located substantially equidistant from an axis or rotation of the RED.
    LETTER DESCRIPTION OF THE DRAWINGS
    Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which: [0007] Figure 1 depicts a lithographic apparatus, according to an embodiment of the invention.
    Figure 2A depicts a top view of a two-armed rotational exchange device, according to an embodiment of the invention.
    Figure 2B depicts a side view of a rotational exchange device, according to an embodiment of the invention.
    Figure 2C depicts a side view of a rotational exchange device having a support, according to an embodiment of the invention.
    Figures 2D-E depict a top view of a two-armed rotational exchange device, according to an embodiment of the invention.
    Figures 3A-D depict a top-view of a three-armed rotational exchange device, according to an embodiment of the invention.
    Figure 4 depicts a method according to an embodiment of the invention.
    [0014 | Figure 5 depicts another method according to an embodiment of the invention.
    Figures 6A-G depict exemplary dynamic operation of a rotational exchange device according to an embodiment of the invention.
    One or more invention of the present invention will now be described with reference to the accompanying drawings. In the drawings, like reference numbers can indicate identical or functionally similar elements. Additionally, the left-most digit (s) or a reference number can identify the drawing in which the reference number appears first.
    DETAILED DESCRIPTION
    This specification discloses one or more features that incorporate the features of this invention. The disclosed embodiment (s) merely exemplify the invention. The scope of the invention is not limited to the disclosed embodiment (s). The invention is defined by the clauses appended hereto.
    The embodiment (s) described, and references in the specification to "one embodiment", "an embodiment", "an example embodiment", etc., indicate that the embodiment (s) described can include a particular feature, structure , or characteristic, but every embodiment cannot necessarily include the particular feature, structure, or characteristic. Moreover, such phrases are not necessarily referring to the same embodiment. Further, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is understood that it is within the knowledge of one skilled in the art to effect such a feature, structure, or characteristic in connection with other is what or not explicitly described.
    Embodiments of the invention can be implemented in hardware, firmware, software, or any combination thereof. Embodiments of the invention can also be implemented as instructions stored on a machine-readable medium, which can be read and executed by one or more processors. A machine-readable medium can include any mechanism for failure or transmitting information in a form readable by a machine (e.g., a computing device). For example, a machine-readable medium can include read-only memory (ROM); random access memory (RAM); magnetic disk storage media; optical storage media; flash memory devices; electrical, optical, acoustic or other forms of propagated signals (e.g., carrier waves, infrared signals, digital signals, etc.), and others. Further, firmware, software, routines, instructions can be described as performing certain actions. However, it should be appreciated that such descriptions are merely for convenience and such actions in fact result from computing devices, processors, controllers, or other devices executing the firmware, software, routines, instructions, etc.
    Figure 1 schematically depicts a lithographic apparatus 100 according to one embodiment of the invention. The lithographic apparatus 100 comprises an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., EUV radiation); a support structure (e.g., a mask table) MT configured to support a patterning device (e.g., a mask or a reticle) MA and connected to a first positioner PM configured to accurately position the patterning device MA; and a substrate table (eg, a wafer table) WT configured to hold a substrate (eg, a resist coated wafer) W and connected to a second positioner PW configured to accurately position the substrate W. The lithographic apparatus 100 also has a projection system (eg, a reflective projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion (eg, including one or more dies) C of the substrate W.
    The illumination system IL may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic or other types of optical components, or any combination thereof, for directing, shaping, or controlling the radiation B.
    The support structure MT holds the patterning device MA in a manner that depends on the orientation of the patterning device MA, the design of the lithographic apparatus 100, and other conditions, such as for example whether or not the patterning device MA is hero in a vacuum environment. The support structure MT may use mechanical, vacuum, electrostatic or other clamping techniques to hold the patterning device MA. The support structure MT may be a frame or a table, for example, which may be fixed or movable, as required. The support structure MT may ensure that the patterning device is at a desired position, for example with respect to the projection system PS.
    The term "patterning device" MA should be broadly interpreted as referring to any device that may be used to impart a radiation beam B with a pattern in its cross-section, such as to create a pattern in the target portion C or the substrate W. The pattern imparted to the radiation beam B may correspond to a particular functional layer in a device being created in the target portion C, such as an integrated circuit.
    The patterning device MA may be transmissive or reflective. Examples of patterning devices MA include reticles, masks, programmable mirror arrays, and programmable LCD panels. Masks are well known in lithography, and include mask types such as binary, alternating phase shift, and attenuated phase shift, as well as various hybrid mask types. An example of a programmable mirror array employs a matrix arrangement of small mirrors, each of which may be individually tilted so as to reflect an incoming radiation beam in different directions. The tilted mirrors impart a pattern in the radiation beam B which is reflected by the mirror matrix.
    The term "projection system" PS may encompass any type of projection system, including refractive, reflective, catadioptric, magnetic, electromagnetic and electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, or for other factors, such as the use of an immersion liquid or the use of a vacuum. A vacuum environment may be used for EUV or electron beam radiation since other gases may absorb too much radiation or electrons. A vacuum environment may therefore be provided for the whole beam path with the aid of a vacuum wall and vacuum pumps.
    As depicted here, the lithographic apparatus is 100 or a reflective type (e.g., employing a reflective mask). Alternatively, the lithographic apparatus 100 may be or a transmissive type (e.g., employing a transmissive mask).
    The lithographic apparatus 100 may be of a type having two (dual stage) or more substrate tables (and / or two or more mask tables) WT. In such "multiple stage" machines the additional substrate tables WT may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other substrate tables are being used for exposure.
    Referring to Figure 1, the illuminator 1L receives a radiation beam from a radiation source SO. The source SO and the lithographic apparatus 100 may be separate entities, for example when the source SO is an excimer laser. In such cases, the source SO is not considered to be part of the lithographic apparatus 100, and the radiation beam B passes from the source SO to the illuminator IL with the aid of a beam delivery system BD (not shown) including, for example , suitable directing mirrors and / or a beam expander. In other cases the source SO may be an integral part of the lithographic apparatus 100, for example when the source SO is a mercury lamp. The source SO and the illuminator IL, together with the beam delivery system BD if required, may be referred to as a radiation system.
    The illuminator 1L may comprise an adjuster AD (not shown) for adjusting the angular intensity distribution of the radiation beam. Generally, at least the outer and / or inner radial extent (commonly referred to as σ-outer and σ-inner, respectively) or the intensity distribution in a pupil plane or the illuminator may be adjusted. In addition, the illuminator IL may include various other components not shown, such as an integrator and a condenser. The illuminator IL may be used to condition the radiation beam B, to have a desired uniformity and intensity distribution in its cross section. 10030J The radiation beam B is incident on the patterning device (e.g., mask) MA, which is hero on the support structure (e.g., mask table) MT, and is patterned by the patterning device MA. MA, the radiation beam B passing through the projection system PS, which radiation beam B onto a target portion C or the substrate W. With the aid of the second positioner PW and position sensor IF2 (eg, an interferometric device, linear encoder or capacitive sensor), the substrate table WT may be moved accurately, eg so as to position different target portions C in the path of the radiation beam B. Similarly, the first positioner PM and another position sensor IF1 may be used to accurately position the patterning device (eg, mask) MA with respect to the path of the radiation beam B. Patterning device (eg, mask) MA and substrate W may be aligned using mask alignment marks Ml , M2 and substrate alignment marks P1, P2.
    The depicted lithographic apparatus 100 may be used in at least one of the following modes: 1. In step mode, the support structure (eg, mask table) MT and the substrate table WT are kept essentially stationary, while an entire pattern B is projected onto a target portion C at one time (ie, a single static exposure). The substrate table WT is then shifted in the X and / or Y direction so that a different target portion may be exposed. 2. In scan mode, the support structure (e.g., mask table) MT and the substrate table WT are scanned synchronously while beamed to the radiation beam B is projected onto a target portion C (i.e., a single dynamic exposure). . The velocity and direction of the substrate table WT relative to the support structure (e.g., mask table) MT may be determined by the (de-) magnification and image reversal characteristics of the projection system PS. 3. In another mode, the support structure (eg, mask table) MT is kept substantially stationary holding a programmable patterning device, and the substrate table WT is moved or scanned while a pattern is imparted to the radiation beam B is projected onto a target portion C. A pulsed radiation source SO may be employed and the programmable patterning device is updated as required after each movement of the substrate table WT or in between successive radiation pulses during a scan. This mode of operation may be readily applied to maskless lithography that utilizes programmable patterning device, such as a programmable mirror array or a type as referred to.
    Combinations and / or variations on the described modes of use or entirely different modes of use may also be employed.
    In an embodiment of the invention, there is provided a method for exchanging reticles MA in a vacuum environment of the lithography tool 100, such as an Extreme Ultraviolet (EUV) lithography tool, that uses a rotational Rapid Exchange Device (RED) to minimize reticle exchange time, particle generation, and outgassing. The method calls for handling a baseplate holding the reticle MA instead of gripping the reticle MA directly with the RED during exchange of the reticle MA. To minimize the reticle exchange time, the RED has at least two robotic grippers that each hold a respective baseplate. Each baseplate may hold a respective reticle MA. By using the multiple robotic grippers, loading of a first reticle to the RED, pre-alignment or a second reticle (if required), transfer of a third reticle to a reticle stage, and buffering or a baseplate for the third reticle may be performed substantially concurrently . By using multiple grippers, the time for a reticle failure, retrieving a second reticle, and a second reticle transferring stage is reduced because at least a part of loading and unloading or multiple reticles at various positions is performed substantially simultaneously instead of serially . The RED also saves time by moving multiple reticles from one position to another substantially simultaneously instead of serially.
    The RED also protects the reticles, as well as unfinished lithography products. The rotational parts of the RED have at least one sealed chamber that holds a motor system, which rotates the RED. The sealed chamber minimizes contamination and outgassing from motor system parts, such as the motor, motor bearings, a position encoder, etc. A scavenging seal, also known as a differential seal or a differentially pumped seal, is used between rotating components and the sealed chamber to maintain a clean vacuum environment outside the RED, while reducing particulate contamination and outgassing from entering the clean vacuum environment. The RED also may have at least one additional sealed chamber that holds a translational mechanism, which translates the RED along the RED's axis of rotation. This second chamber has bellows to separate a vacuum from dirty components in the translational mechanism, such as an actuator, bearings, etc. The RED's bellows reduce particulate contamination and outgassing entering the vacuum.
    Figures 2A-2E illustrate an embodiment of the invention that has a two-armed rotational exchange device (RED) 200. Following are Figures 3A-3D, which show an embodiment of the invention that has a three-armed rotational exchange device (RED) 300. Although two-and three-armed REDs 200, 300 are illustrated, these examples are not limiting. Various different may have two or more arms, and thus simultaneously transport two or more reticles. Also, in various possibilities, a first arm or a RED may be fixed at any angle relative to a second arm or a RED.
    Figure 2A depicts a top view of the two-armed rotational exchange device 200. The two-armed RED 200 has a first arm 205 and a second arm 210 that rotates about a central axis 215, which runs into the page. At an end of the first arm 205 is a first robotic gripper 220 that is configured to hold a first baseplate 222, which is configured to hold a first reticle 225. Similarly, at the end of the second arm 210 is a second robotic gripper 230 that is configured to hold a second baseplate 232, which is capable of holding a second reticle 235, Thus, the first arm 205 and the second arm 210 are baseplate supports.
    The first and second base plates 222,232 and the first and second arms 205,210 are configured to rotate in unison. In an embodiment, the first and second base plates 222, 232 are located substantially equidistant from the central axis 215. In an embodiment, the first arm 205 is located at an angle substantially ninety degrees from the second arm 210.
    [0038] According to an embodiment of the invention, the two-armed RED 200 rotates to three positions. The first position is a reticle loading and unloading position 240. In the reticle loading and unloading position 240, a first baseplate 222 holding the first reticle 225 is transferred between the first robotic gripper 220 and a reticle storage device by a first robotic device (not shown). The second position is a reticle stage loading and unloading position 245. In the reticle stage loading and unloading position 245, the first reticle 225 is transferred between the first baseplate 222 and a reticle stage (not shown), such as the support structure MT in the lithographic apparatus 100 or Figure 1. The first reticle 225 can be transferred by the RED 200 directly to the reticle stage (not shown). The third position is a baseplate buffering position 250. When the first reticle 225 is located on the reticle stage, the two-armed RED 200 rotates and moves the first robotic gripper 220 and the first baseplate 222 to the baseplate buffering position 250 to keep the two-armed RED 200 from interfering with use of the first reticle 225. It is appreciated that in the various positions, the second reticle 235 may be processed and exchanged in a manner similar to the first reticle 225. Dynamic operation of the two-armed RED 200 is described in further detail elsewhere.
    Figure 2B depicts a partial side view of the two-and three-armed rotational exchange devices 200, 300, according to the invention. For simplicity, only one exemplary arm, the first arm 205, is shown in Figure 2B. Other arms of the two-and three-armed rotational exchange devices 200, 300 may have a similar arrangement.
    Figure 2B shows that at a distal end of the first arm 205 is found the first robotic gripper 220 holding the first baseplate 222, which in turn holds the first reticle 225. The first arm 205 rotates about the central axis 215 through being coupled to a shaft 255. The shaft 255 is mechanically coupled to a motor system 256, which is configured to rotate the shaft 255. An optional position encoder 258 may be coupled to the shaft 255 to provide positional feedback. In the example illustrated in Figure 2B, the shaft 255 not only rotates, but also is translatable, as shown by arrow 259, along the axis of rotation 215, so that the RED 200, 300 is translatable along the axis of rotation 215. Translation of the RED 200, 300 permit transfer or base plates and reticles at different heights along the central axis 215. An actuator 262 is mechanically coupled to the shaft 255 to translate the shaft 255 along the axis of rotation 215.
    The motor system 256 and actuator 262 are sealed in a chamber 260, such that outgassing and particle contamination from the motor system is substantially eliminated from the clean vacuum when compared to conventional reticle exchange devices. The chamber 260 is sealed about the shaft 255 with a seal 265, such as a scavenging seal which further eliminates particle generation that would be present with a traditional O-ring seal and outgassing grease that would be required for the traditional O-ring seal. Flexible bellows 270 keep the chamber 260 sealed when the shaft 255 translates along the axis of rotation 215.
    Figure 2C depicts a side view of the two-and three-armed rotational exchange devices 200, 300, which is an alternative arrangement to that shown in Figure 2B, according to one embodiment of the invention. As in Figure 2B, for simplicity, only one exemplary arm, the first arm 205, is shown in Figure 2C. Other arms of the two-and three-armed rotational exchange devices 200, 300 may have a similar arrangement.
    The chamber 260 in Figure 2C contains a motor system 256 to rotate the shaft 255. The chamber 260 is mounted on a support 285, which is coupled to actuators 286,287, which translate the shaft 255, the chamber 260, and the frame 285 along the axis of rotation 215. The actuators 286, 287 have respective flexible bellows 288, 289 to seal the actuators 286, 287 from the surrounding atmosphere, such as a vacuum, when the shaft 255 translates along the axis of rotation 215. Use of the bellows 288, 289 substantially eliminates outgassing and particle contamination from the actuators 286, 287 when compared to those of conventional reticle exchange devices.
    A combination of Figures 2A, 2D, and 2E illustrates exemplary dynamic operation of the two-armed RED 200. Figure 2A shows the first arm 205 in the reticle loading and unloading position 240, where the first reticle is 225 and baseplate 222 loaded on the first arm 220. The two-armed rotational exchange device 200 then rotates the first arm 205 to the reticle stage loading and unloading position 245 as shown in Figure 2D. After the first reticle 225 is loaded to the reticle stage from the first baseplate 222, the first arm 205, still holding the first baseplate 222, is rotated to the baseplate buffering position 250, which is illustrated in Figure 2E.
    While the first arm 205 is in the baseplate buffering position 250, the first reticle 225, at position 245, is used to impart a radiation beam with the pattern in its cross-section, such as to create the pattern in a target portion of a substrate. When the first reticle 225 is no longer needed for patterning, the first arm 205, still holding the first baseplate 222, returns to the reticle stage loading and unloading position 245, where the first reticle 225 is unloaded from the reticle stage back onto the first baseplate 222. The two-armed rotational exchange device 200 then rotates the first arm 205 back to the reticle loading and unloading position 240 as shown in Figure 2A, where the first reticle 225 with the baseplate 222 is unloaded from the two-armed RED 200 .
    While the first baseplate 222 is buffered in the baseplate buffering position 250, the second reticle 235 is substantially simultaneously transferred at the reticle loading and unloading position 240 between the RED and the reticle storage device. Substantially simultaneous buffering of the first baseplate 222 and transfer of the second reticle 235 saves time and increases throughput of the RED 200 when compared to conventional reticle exchange devices.
    Figures 6A-6G depict exemplary dynamic operation of a rotational exchange device, such as the two-armed RED 200, according to an embodiment of the invention. In Figures 6A-6G, a reticle is identified by an identifier number "N." A reticle stage location is denoted by "RS." A location for the reticle handler is indicated as "RH." In one embodiment, operation of the rotational exchange device as shown in Figures 6A-G is similar to that described above with regard to the two-armed RED 200, with the exceptions of any differences depicted in Figures 6A-G, as would be apparent to a skilled artisan.
    Figure 3A depicts a top view of the three-armed rotational exchange device (RED) 300. The three-armed RED 300 has a first arm 305, a second arm 310, and a third arm 312 that rotate about a central axis 315, going into the page. At an end of the first arm 305 is a first robotic gripper 320 that is configured to hold a first baseplate 322, which is configured to hold a first reticle 325. Similarly, at the end of the second arm 310 is a second robotic gripper 330 that is configured to hold a second baseplate 332, which is configured to hold a second reticle 335. At the end of the third arm 312 is a third robotic gripper 332 that is configured to hold a third baseplate 334, which is configured to hold a third reticle 337. The first, second, and third baseplates 322, 332, 334 and the first, second, and third arms 305, 310, 312 are configured to rotate in unison. In an embodiment, the first, second, and third baseplates 322, 332, 334 are located substantially equidistant from the central axis 315.
    According to an embodiment of the invention, the three-armed RED 300 rotates through four positions. The first position is a reticle loading and unloading position 340, where reticles and baseplates are loaded from a reticle storage device (not shown) onto a RED arm. In the reticle loading and unloading position 340, the first reticle 325 and the first baseplate 222 are either transferred to or from the first robotic gripper 320 to the reticle storage device. The second position is a reticle prealignment position 342. In the reticle prealignment position 342, the first reticle 325 is prealigned prior to transfer to a reticle stage (not show), such as the support structure MT in the lithographic apparatus 100, shown in Figure 1. The third position is a reticle stage loading and unloading position 345. In the reticle stage loading and unloading position 345, the first reticle 325 is transferred between the first baseplate 322 and the reticle stage (not shown). The fourth position is a baseplate buffering position 350. When the first reticle 325 is located on the reticle stage, the three-armed RED 300 rotates the first robotic gripper 320 and the first baseplate 322 to the baseplate buffering position 350 to keep the three- armed RED 300 from interfering with use of the first reticle 325, for example during patterning or a beam of radiation for an exposure operation. In the various positions, the second reticle 335 may be processed and exchanged in a manner similar to that of the first reticle 325. Similarly, in the various positions, the third reticle 337 may be processed and exchanged in a manner similar to that of the first reticle 325. Dynamic operation of the three-armed RED 300 is now described in further detail. (0050) The combination of Figures 3A-D illustrate exemplary dynamic operation of the three-armed RED 300. Figure 3 A shows the first arm 305 in the reticle loading and unloading position 340, where the first reticle 325 and baseplate 322 is loaded on the first RED arm 305 from the reticle storage device by a first robotic device (not shown). The three-armed RED 300 then rotates the first arm 305 to the reticle prealignment position 342, as shown in Figure 3B, where the first reticle 325 is prealigned. Following reticle pre-alignment, the three-armed RED 300 then rotates the first arm 305 to the reticle stage loading and unloading position 345, as shown in Figure 3C. After the first reticle 325 is loaded to the reticle stage from the first baseplate 322, the first arm 305, still holding the first baseplate 322, is rotated to the baseplate buffering position 350, which is illustrated in Figure 3D.
    While the first arm 305 is buffering position 350 in the baseplate, the first reticle 325 is used to impart a radiation beam with a pattern in its cross-section, such as to create the pattern in a target portion or a substrate. When the first reticle 325 is no longer needed for patterning, the first arm 305, still holding the first baseplate 322, returns to the reticle stage loading and unloading position 345, as shown in Figure 3C, where the first reticle 325 is unloaded from the reticle stage back onto the first baseplate 322. The three-armed RED 300 then rotates the first arm 305 back to the reticle loading and unloading position 340 as shown in Figure 3A, where the first reticle 325 with the first baseplate 322 is unloaded from the three-armed RED 300 by the first robotic device.
    While the first reticle 325 is being prealigned in the reticle prealignment position 342, the second arm 310 is located in the baseplate buffering position 350, where the second baseplate 332 may be buffered. Also, while the first reticle 325 is being prealigned in the reticle prealignment position 342, the third arm 312 is located at the reticle loading and unloading position 340, where the third reticle 337 with the third baseplate 334 may be loaded onto, or unloaded from , the three-armed RED 300. Prealignment of the first reticle 325, buffering of the second baseplate 332, and transfer of the third reticle 337 is performed substantially simultaneously to save processing time and increase throughput of the three-armed RED 300 when compared to conventional vacuum reticle exchange devices such as a single arm vacuum robot. When the three-armed RED 300 is rotated, the first, second, and third baseplates 322, 332, 334 also rotate substantially simultaneously, so that multiple reticles are moved between the processing positions substantially simultaneously to save processing time and increase throughput of the three -armed RED 300 when compared to conventional reticle exchange devices.
    Figure 4 is a flowchart that illustrates exemplary method 400. For example, method 400 may be performed using the devices of Figures 1, 2A-E, and 3A-D. In step 405, a first baseplate holding a first reticle on a first arm or a rotational exchange device (RED) is received. In step 410, a second reticle is transferred from the second baseplate to a reticle stage. In step 415, a second baseplate supported by a second arm of the RED is buffered. In one example, the first and second base plates are located substantially equidistant from an axis or rotation of the RED. The buffering may optionally be performed simultaneously with the receiving. In step 420, a second reticle is transferred from the reticle stage to the second base plate. In step 425, a third reticle hero by a third baseplate supported by a third arm of the RED is prealigned.
    [0054 | In step 430, the RED is rotated with a motor system. The motor system is sealed in an evacuated chamber, such that outgassing and particle contamination from the motor system is substantially eliminated. The RED may be rotated to move any of the baseplates to any of the positions. For example, the RED may be rotated to move the first baseplate to a position that allows for pre-alignment or the first reticle or rotated to move the first baseplate to a position that allows for transfer of the first reticle to the reticle stage. Further, the RED may be rotated to move the first baseplate to a position that allows for transfer of the first reticle from the reticle stage to the first baseplate or rotated to move the first baseplate to a position that allows for buffering the first baseplate. In another example, the RED is rotated to move the first baseplate to a position that allows for transfer or the first baseplate off of the RED. In step 435, the first baseplate is unloaded from the RED.
    All steps in the method 400, other than step 405 and step 415 are optional. In an embodiment, at least a part of the method 400 may be performed by at least a part of the lithographic apparatus 100, the two-armed RED 200, and / or the three-armed RED 300.
    Figure 5 is a flowchart that illustrates an exemplary method 500. In an embodiment, at least a part of the method 500 may be performed by at least a part of the lithographic apparatus 100, the two-armed RED 200, and / or the three-armed RED 300. In step 505, a first reticle with a first baseplate is loaded onto a first position. In step 510, a second reticle supported by a second baseplate is pre-aligned at a second position. In step 515, a third baseplate is buffered at a third position. The loading, pre-alignment, and buffering may be performed substantially simultaneously. In step 520, the rotary support device is rotated to move the first reticle to the second position. In step 525, the first reticle with the first baseplate is unloaded from the first arm.
    Although specific references are made in this text to the use of lithographic apparatus 100 in the manufacture of ICs, it should be understood that the lithographic apparatus 100 described may have other applications, such as the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc.
    Although specific reference are made for the use of the invention in the context of optical lithography, it will be appreciated that the invention may be used in other applications, for example imprint lithography, and where the context allows, is not limited to optical lithography.
    [The terms "radiation" and "beam" used include compass and all types of electromagnetic radiation, including ultraviolet (UV) radiation (eg, having a wavelength of or about 365, 355, 248, 193, 157 or 126 nm) and extreme ultra-violet (EUV) radiation (eg, having a wavelength in the range of substantially 5-20 nm), as well as particle beams, such as ion beams or electron beams.
    While specific expired of the invention have been described, it will be appreciated that the invention may be practiced otherwise than as described. For example, at least a part of the invention may take the form of a computer program containing one or more sequences of machine-readable instructions describing a method as disclosed, or a data storage medium (eg, semiconductor memory, magnetic or optical disk) having such a computer program stored therein.
    Conclusion While various presentations of the present invention have been described above, it should be understood that they have been presented by way of example only, and not limitation. It will be apparent to persons skilled in the relevant art that various changes in form and detail can be made therein without departing from the spirit and scope of the invention. Thus, the breadth and scope of the present invention should not be limited by any of the above-described examples, blit should be defined only in accordance with the following clauses and their equivalents.
    The Detailed Description section, and not the Summary and Abstract sections, is intended to be used to interpret the clauses. The Summary and Abstract sections can be set forth one or more, but not all exemplary of the present invention as contemplated by the inventor (s), and thus, are not intended to limit the present invention and the applied clauses in any way. Other aspects of the invention are set out as in the following numbered clauses: 1. A method, including: (a) receiving a first baseplate holding a first reticle on a first arm or a rotational exchange device (RED); and (b) buffering a second baseplate supported by a second arm of the RED, the first and second baseplates being located substantially equidistant from an axis of rotation of the RED. 2. The method of clause 1, further including: (c) aligning a third reticle hero by a third baseplate supported by a third arm of the RED. 3. The method of clause 1, further including: (c) rotating the RED with a motor system having an encoder, the motor system being sealed in an evacuated chamber, such that outgassing and particle contamination from the motor system is substantially eliminated. 4. The method of clause 1, further including performing steps (a) and (b) substantially simultaneously. 5. The method of clause 1, further including: (c) unloading the first baseplate from the RED. 6. The method of clause 1, further including: (c) transferring a second reticle from the second baseplate to a reticle stage. 7. The method of clause 1, further including: (c) transferring a second reticle from a reticle stage to the second baseplate. 8. The method of clause 1, further including: (c) rotating the RED to move the first baseplate to a position that allows for pre-alignment or the first reticle. 9. The method of clause 1, further including: (c) rotating the RED to move the first baseplate to a position that allows for transfer or the first reticle to a reticle stage. 10. The method of clause 1, further including: (c) rotating the RED to move the first baseplate to a position that allows for buffering the first baseplate. 11. The method of clause 1, further including: (c) rotating the RED to move the first baseplate to a position that allows for transfer or the first baseplate off of the RED. 12. A system, including: a rotary support device having an axis of rotation; a first baseplate support connected to the rotary support device and configured to support a first baseplate at a first position that allows for receiving or a first reticle hero by the first baseplate; and a second baseplate support connected to the rotary support device and configured to support a second baseplate at a second position that allows for buffering or a second reticle hero by the second baseplate, the first and second baseplate supports are located substantially equidistant from the axis or rotation and are configured to rotate in unison. 13. The system of clause 12, further including: a third baseplate support connected to the rotary support device and configured to support a third baseplate at a third position that allows for buffering of the third baseplate. 14. The system of clause 12, further including: an evacuated chamber configured to seal a motor system having an encoder, such that outgassing and particle contamination from the motor system is substantially eliminated, the motor system is configured to rotate the rotary support device . 15. The system of clause 13, the evacuated chamber further comprises bellows configured to seal the rotating device and permit translation of the rotary support device along the axis of rotation. 16. The system of clause 13, the evacuated chamber further comprises a differential seal configured to seal the rotating device. 17. The system of clause 13. the system is configured to substantially simultaneously perform the pre-alignment, the receiving, and the buffering. 18. The system of clause 13, at least one of the first baseplate support, the second baseplate support, and the third baseplate support comprises a gripper to hold the first baseplate. 19. The system of clause 12, further including an actuator configured to translate the rotary support device along the axis of rotation. 20. A method including: (a) loading a first reticle with a first baseplate onto a first position; (b) pre-aligning a second reticle supported by a second baseplate at a second position; and (c) buffering a third baseplate at a third position, following the steps (a), (b), and (c) are performed substantially simultaneously. 21. The method of clause 20, further including: (d) rotating the rotary support device to move the first reticle to the second position. 22. The method of clause 20, further including: (d) unloading the first reticle with the first baseplate from the first arm.
    权利要求:
    Claims (1)
    [1]
    A lithography device comprising: an illumination device adapted to provide a radiation beam; a carrier constructed to support a patterning device, the patterning device being capable of applying a pattern in a section of the radiation beam to form a patterned radiation beam; a substrate table constructed to support a substrate; and a projection device adapted to project the patterned radiation beam onto a target area of the substrate, characterized in that the substrate table is adapted to position the target area of the substrate in a focal plane of the projection device.
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    法律状态:
    2009-12-01| AD1A| A request for search or an international type search has been filed|
    2010-04-01| EDI| The registered patent application has been withdrawn|
    优先权:
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    US7126808P| true| 2008-04-18|2008-04-18|
    US7126808|2008-04-18|
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